Revealing the Wear Behavior of Chemical Vapor Deposited Monolayer WS2 Using AFM Under Ambient Conditions
摘要
In the present study, atomic force microscopy (AFM) was used to analyze the wear behavior of tungsten disulfide (WS2) grown using chemical vapor deposition (CVD). It was discovered that the essential load-carrying capability of the interior area of the WS2 flake was greater than the edge region. Also, the inconsistent wear behavior in both conditions was explained by experimental results. The presence of structural defects can explain the observed disparity in the wear behavior. This work provides a path for enhancing the tribological characteristics of monolayer WS2 as a 2D solid lubricant since edges are usual in CVD-grown two-dimensional (2D) materials and cannot be avoided.