Graphene-Based Interconnect for Semiconductor-Plausible Goal or Elusive Goal?
摘要
The continuous miniaturization and increasing complexity of semiconductor devices have necessitated the development of advanced interconnect technologies. Graphene, a two-dimensional (2D) material with exceptional electrical and mechanical properties, has emerged as a promising candidate for next-generation interconnects. This chapter explores the feasibility and challenges associated with implementing graphene-based interconnects in the semiconductor industry. By examining the current state of research, fabrication techniques, and potential applications, we aim to determine whether graphene-based interconnects are a plausible goal or remain an elusive goal.