Ion Implanted Modification of Nanomaterials for Semiconductor Devices and Other Applications

Ion implantation is one of the most prestigious techniques used for circuit and device fabrication. It involves various processes to implant ion species into the material that alter the physicochemical states in the surface or near-surface region of the materials. Optimistic changes in the states with controlled doping and controlled depth with desirable doping species is the characteristic feature of ion implantation. A clear understanding of its processes and changes involved in the physicochemical states of modified structure is precious for utilizing ion implantation phenomena to engineer the material surface properties. This chapter presents the physics and material science of ion implantation, as well as its modifications and applications in various fields such as semiconductor devices, biomedical engineering, nanophotonics, nanoparticle synthesis, energy storage devices, etc. It also covers the present perspective of ion implantation in nanoscience and technology.