Photomask and Photoresist

The photolithography is the most critical step for the IC fabrication, among which the photomask and photoresist are the necessary materials. The photomask is commonly used as the printing master plate on the photolithography process. The mask pattern can be transferred on the substrates with the help of the photoresist. The basic knowledge on the photomask, photoresist, phase-shift mask, DUV lithography photomask, and DUV photoresist has firstly been introduced in this chapter. With the development of lithography technology, extreme ultraviolet (EUV) and mask technology have attracted most attention, concerning the EUV lithography photomask and photoresist. Then, next-generation lithography materials have also been prospected. Moreover, photosensitive polyimides, antireflection coating, and ancillaries have also been illustrated.