This review article provides a thorough description of the processes, workings, and uses of photodeposition in photocatalysis. Its goal is to generalize findings from the literature about how varied process parameters during photodeposition affect variables including particle size distributions, metal oxidation states, and the ensuing photocatalytic activity of various metals and semiconductors. The employment of sacrificial agents, pH ranges, the presence of air or inert atmospheres, metal precursor kinds and concentrations, temperature, and more are discussed in the article along with other crucial process parameters. Studies involving TiO2, ZnO, WO3, and CdS are highlighted, with a special emphasis on the photodeposition of Pt and Ag. In addition, the article provides a thorough summary of developments in structure-directed photodeposition, which shows promise for the creation of materials that are particularly effective in photocatalysis. Overall, the goal of this review is to give readers a thorough understanding of photodeposition’s procedures, workings, and uses in relation to photocatalysis.