Preliminary Experimental Investigation into Work Brush Temperature on Silicon Wafer Using Single Pole Magnetic Abrasive Finishing (SPMAF)

This paper outlines the approach on super finishing process for silicon wafer surface finishing with single pole magnetic abrasive finishing using chemical oxidizers like Marshall’s acid salt and Caro’s acid salt. Initially, based on the factorial design four preliminary trails were carried in the dry finishing process of silicon wafers at constant polishing speed and varying the machining-gap and feed rate on the workpiece. The work brush temperature on the workpiece surface was recorded. Thereafter wet polishing with eight experiments based on aforesaid design with slurry containing chemical oxidizers was carried out and temperature on the workpiece surface was recorded in each trail. The study aims to examine the influence of process factors such as polishing speed, working gap and workpiece feed rate on work brush temperature and draw comparison between the distinct processes using the infrared thermometer.