Structural Characterization of Chorine Doped Cuprous Oxide Thin Films by X-Ray Diffraction and X-Ray Fluorescence

This study investigates the structural changes in Cl-doped Cu2O thin films through X-ray diffraction (XRD). The incorporation of Cl– ions into the Cu2O lattice is analyzed at varying concentrations. XRD patterns reveal shifts in the (111) peak due to Cl– ion interaction, indicative of interstitial and substitutional incorporation. The lattice parameter and interatomic distance are compared between theoretical and experimental values, reflecting volume changes caused by Cl– ion presence. At lower concentrations, interstitial incorporation contracts the lattice, while higher concentrations lead to lattice expansion through substitutional incorporation. These findings provide insights into the structural modifications induced by Cl– doping, crucial for understanding the conductive properties of the thin films.