Recent Advances in the Development of Pulsed Laser Deposited Thin Films

The technique known as pulsed laser deposition is a popular approach to depositing thin material films onto a substrate. Using a high-powered laser to vaporize a target material, and then depositing it onto a substrate is the process employed to create a thin film. The mechanism of pulsed laser deposition is based on the principle of laser induced ablation. In this work, preparation and development of pulsed laser deposited films were reported. Deposition of nanostructured films onto different substrates such as InP(111), silicon, stainless steel, strontium titanate, Single crystal sapphire, quartz, plastic foil, molybdenum coated glass, yittria stabilized zirconia substrate, aluminum oxide substrate, polyimide, Corning glass, MgO substrate, and single crystal SrTiO3 substrates. The produced films could be used in many applications including projection television, diode lasers, thermometry, fluorescence microscopy, optoelectronic devices, rechargeable lithium battery, phase-change materials in memory application, quantum dot and plasmonics applications. In addition, experimental results showed that prepared films could be used as absorber materials of solar cell applications due to appropriate band gap value, excellent adsorption coefficient, and cheaper materials costs. Researchers have pointed out the growth rate, desired structural, electrical, compositional and the optical properties could be controlled using different deposition parameters during the preparation of films.