Microwave Plasma Enhanced Chemical Vapor Deposition (MPCVD) is a leading technique for producing high-quality diamond crystals under relatively low temperature and pressure conditions. This method was utilized to optimize various growth parameters, including substrate temperature (ranging from 800 to 950 °C), gas pressure (between 120 and 150 Torr), and the concentrations of H2, CH4, and N2 during deposition. By simultaneously adjusting the growth parameters and analyzing them, the quality of the resulting sample was enhanced. The substrate temperature was monitored with an infrared pyrometer, while gas flow rates were controlled through a mass flow controller. Raman Spectroscopy was performed to verify the diamond phase of the produced samples. Additionally, the optical absorption of the optimized samples was assessed using UV-VIS spectroscopy to determine their transparency over a wavelength range. The resulting diamond crystals exhibit exceptional material qualities, making them suitable for a variety of applications, including high-power electronics, radiation detectors, optical components for lasers, and windows for radio frequencies. New potential applications for high-quality single crystal diamonds may also include quantum sensing and erosion-resistant coatings in nuclear fusion reactors.