Effect of Annealing Rate and Annealing Temperature on Structural Properties of PZT Thin Films
摘要
Lead zirconate titanate (PZT) thin films are of significant interest in various technological applications, including MEMS sensors/actuators and non-volatile memories, owing to their exceptional piezoelectric and ferroelectric properties. In this work, PZT [Pb(Zr0.52Ti0.48)O3] thin films are deposited on Pt/Ti/SiO2/Si substrates using the sol-gel method. The deposited films are annealed at different temperatures (600, 650 and 700 °C) and heating rates (2, 10 °C/min) to realize the perovskite phase formation. We systematically investigated the effect of annealing temperature as well as the rate of annealing on the structural properties of PZT thin films, using x-ray diffraction and Raman spectroscopy. Our results indicate the importance of the annealing rate as well as the annealing temperature for the formation of perovskite phase.