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Using poly(ethylene glycol) methyl ether methacrylate (Mn ≈ 2000) as the reactive emulsifier, 2,2′-azobis(2,4-dimethyl)valeronitrile (ABVN) as the free radical initiator, and n-propanol/water blend (5:1 in mass ratio) as the mixed solvent, a stable fluorine-containing polymer emulsion was prepared by semicontinuous polymerization of dodecafluoroheptyl methacrylate (DFHMA) and styrene. The emulsions were characterized by FTIR, SEM, TG, and DSC. A coating solution comprising the fluorine-containing polymer emulsion, a near-infrared (NIR) absorbing agent (830 nm), and other components was prepared and applied to the aluminum lithographic substrate by spin-coating method to obtain the infrared light-sensitive thin-film coating. After infrared laser exposure and development of the coating, the exposed areas of the coating remained on the substrate whereas the non-exposed areas of the coating were removed from the support. Finally, the substrate with a clear lithographic image could be obtained. The wettability of the coatings was evaluated by measuring the contact angle. Results showed that the exposed coating was highly hydrophobic.

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Preparation of a Near-Infrared Light-Sensitive Coating Based on Fluorine-Containing Polymer Emulsion

  • 会议论文

  • 发表日期：

    2025年

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  • Li An,
  • Wenfeng Xie,
  • Ruping Liu,
  • Xinlin Zhang,
  • Zhongxiao Li

摘要

Using poly(ethylene glycol) methyl ether methacrylate (Mn ≈ 2000) as the reactive emulsifier, 2,2′-azobis(2,4-dimethyl)valeronitrile (ABVN) as the free radical initiator, and n-propanol/water blend (5:1 in mass ratio) as the mixed solvent, a stable fluorine-containing polymer emulsion was prepared by semicontinuous polymerization of dodecafluoroheptyl methacrylate (DFHMA) and styrene. The emulsions were characterized by FTIR, SEM, TG, and DSC. A coating solution comprising the fluorine-containing polymer emulsion, a near-infrared (NIR) absorbing agent (830 nm), and other components was prepared and applied to the aluminum lithographic substrate by spin-coating method to obtain the infrared light-sensitive thin-film coating. After infrared laser exposure and development of the coating, the exposed areas of the coating remained on the substrate whereas the non-exposed areas of the coating were removed from the support. Finally, the substrate with a clear lithographic image could be obtained. The wettability of the coatings was evaluated by measuring the contact angle. Results showed that the exposed coating was highly hydrophobic.