In scanning probe lithography (SPL), raster and vector scanning methods are commonly used for lithography. Raster scanning is time-consuming; vector scanning is typically employed for intricate designs with small features. However, achieving multiscale patterning using a single scanning method poses a challenge. We propose a modified vector scanning approach utilizing Electrolithography (ELG) for large-scale patterning through closed-loop geometry. ELG, a subtype of SPL, exploits electrical-field-induced material formation and transport on chromium (Cr) thin films. By incorporating a polymer layer between the Cr film and substrate, patterned structures can be transferred onto the substrate. Our study demonstrates that creating a closed-loop geometry on the sample and developing it in solvent lifts off the enclosed closed-loop geometry Cr film along with the polymer. We identified a critical value of 40 µm for the square’s side length, ensuring effective development and transfer onto the substrate. This modified vector scanning method offers a promising solution for efficient and large-scale patterning in SPL.