Phase-Selective Synthesis of Oxide Materials via Mist Chemical Vapor Deposition
摘要
A mist chemical vapor deposition (CVD) method, which is inexpensive and environmentally friendly, thus a sustainable method for thin film growth, has provided us with opportunities to fabricate various oxide thin films. This chapter reviews our previous work on the mist CVDMist CVD growth ofR-GeO2 r-GeO2 and r-GexSn1−xO2 alloyR-GexSn1−xO2 alloy films. We also discuss the synthesis of materials that are difficult to crystallize, like volatile or non-equilibrium-phased oxides by the mist CVDMist CVD method.