Sputtering Yield Calculations of TiB2 Under Deuterium Plasma by Using Molecular Dynamic Operations

The primary goal of developing a Tokamak reactor fusion device is to maintain the plasma core process for producing heat energy that is used by a turbine to produce electricity. Solving the process issues of Tokamak reactors is a significant task due to the interactions between plasma and materials. Due to the fact that interactions between plasma and surface material take place at the molecular level. The molecular dynamics of advanced ceramic materials of TiB2 surface processes exposed to deuterium plasma are investigated in this work. In Tokamak fusion reactors, TiB2 is one of the potential structural materials for divertor regions. The system's kinetic energy, potential energy, and sputtering yield are produced at the conclusion of the molecular dynamics process. Accordingly, the target surface morphology, chemistry, and plasma characteristics all influence the plasma-induced surface morphology of the TiB2 surface layers. Based on molecular dynamics operations, related impurity-driven surface characteristics are a well-documented process in experimental work published in the literature. Because this theoretical investigation will confirm that the material surface characteristics in samples exposed to plasma have a chemical characterization.