In laser processing and laser measurement, measuring the laser beam profile is important. Conventional measurement methods in which laser light is directly incident on an image sensor have the disadvantage that the laser light is blocked, making measurement difficult when the laser light intensity is high. In this paper, to overcome these disadvantages the author proposed a laser beam profile measurement method using the light scattering phenomenon in the atmosphere and computed tomography (CT), and considered how to design the optical system required for this measurement. As a result, the author found a method to determine the optimal magnification and F-number of the optical system, the measurable laser beam diameter, and the measurable pulse laser light energy for beam profile measurement of 532 nm laser light that satisfies ISO11146.

错误:搜索内容不能为空,请输入英文关键词
错误:关键词超出字数限制,请精简
高级检索

Design of Optical System for Measuring the Beam Profile of High-Intensity Laser Light Using Light Scattering Phenomena

  • Koichi Miyazaki

摘要

In laser processing and laser measurement, measuring the laser beam profile is important. Conventional measurement methods in which laser light is directly incident on an image sensor have the disadvantage that the laser light is blocked, making measurement difficult when the laser light intensity is high. In this paper, to overcome these disadvantages the author proposed a laser beam profile measurement method using the light scattering phenomenon in the atmosphere and computed tomography (CT), and considered how to design the optical system required for this measurement. As a result, the author found a method to determine the optimal magnification and F-number of the optical system, the measurable laser beam diameter, and the measurable pulse laser light energy for beam profile measurement of 532 nm laser light that satisfies ISO11146.