For the micro-nano-fabrication technology in the field of precision engineering, this chapter mainly introduces the planar microfabrication technology and probe processing technology. At present, high aspect ratio structures are widely relied on in emerging technology fields such as large-scale integrated circuits. The measurement methods of complex micro-nanostructures are mainly divided into two categories. One is the noncontact measurement methods represented by various laser interferometers and electron microscopes. This method is limited by the depth of field and small lens focusing range when the depth width ratio is large. The other is the contact measurement method represented by high-precision probe profiler and scanning probe microscopy. This method has high resolution, but the length diameter ratio of conventional probe is small, which cannot meet the measurement requirements of structures with high aspect ratio. This chapter introduces the representative etching technology of planar microfabrication technology, the representative micronano-processing technology of probe processing technology, the micro-nano-processing technology based on atomic force microscope probe, and the scanning probe processing technology for micro-nanostructure with large aspect ratio.