In this work, we studied the impact of chromium (Cr) doping on the electrochemical properties of nickel cobaltiteNickel cobaltite (Ni1−xCrxCo2O4) thin filmsThin films prepared using a solution-based method. Notably, in this work, we prepared samples with Cr dopingCr-doping levels of 2.5% (Ni0.975Cr0.025Co2O4), 5% (Ni0.95Cr0.05Co2O4), and 10% (Ni0.9Cr0.1Co2O4) alongside the undoped sample (NiCo2O4). We used the advanced characterization technique of ElectrochemicalImpedance spectroscopy Impedance SpectroscopyElectrochemical impedance spectroscopy (EIS) to characterize charge transfer, oxidation states, and some capacitor behavior of the material. The analysis of the EIS results showed the remarkably low charge-transfer resistance for Ni0.975Cr0.025Co2O4 compared to the other doping levels, indicating optimal charge-transfer kinetics at this level of doping. The Cyclic Voltammetry (CV) studies confirmed these results, as the 2.5% Cr doped (Ni0.975Cr0.025Co2O4) had the largest curve area, which signifies improved capacitive behavior versus the higher levels of doping as well as the original undoped sample. The Galvanostatic Charge–Discharge (GCD) measurement verified the electrochemical capacity trend of Ni0.975Cr0.025Co2O4, which yielded a maximum specific capacitance of 1151.73 F g−1 at 2 A/g current density. These results demonstrate that moderate Cr doping effectively enhances the electrochemical performanceElectrochemical performance of NiCo2O4, highlighting its promise for energy storage applications.