Effect of Tin Oxide and Spiro-OMeTAD Thin Layers on Optical and Electrical Properties of Fluorine-Doped Tin Oxide/Methylammonium Lead Iodide Perovskite Solar Cell
摘要
This study investigates fluorine-doped tin oxide (FTO)/ Methylammonium Lead Iodide (MAPbI3) solar cells configured with Tin oxide (SnO2) electron transport layers at different thicknesses of 15, 30, and 40 nm, which are fabricated through radio frequency (RF) magnetron sputtering under, 5, 10, and 15 min of spurting time supports to various thickness layer formations. Impacts of processing and SnO2 ETL layers on microstructural behaviour of FTO/MAPbI3 solar cells are examined through transmission electron analysis and observed that the microstructure of the SnO2 layer is uniformly dispersed with the base layer and very shortest gap between the nanoparticles influences to increasing the optical behaviour and better electrical properties compared to monolithic solar layer. The SnO2 ETL thickness influences better electrical and optical behaviour. The FTO/MAPbI3 solar cell with 30 nm SnO2 ETL layer showed better-reduced transmittance (63%) and better refractive index (2.2), better absorption coefficient (2.2 × 104 per cm) and enhanced optical band gap (1.61 eV) and improved efficiency of the solar cell.