Quality control in semiconductor manufacturing is critical for ensuring the reliability of electronic devices. Among the various challenges faced, the detection of surface defects on processor sockets remains a significant hurdle due to the limitations of manual inspection methods. This study introduces a machine learning-based approach to automate and enhance the accuracy of surface defect detection in processor sockets. We detail the development and implementation of a convolutional neural network (CNN) model, which leverages transfer learning techniques to overcome the constraints of limited and imbalanced data. Our methodology includes a comprehensive data acquisition process using high-definition digital microscopy, followed by data augmentation strategies to ensure robust model training. The results demonstrate that our model achieves a testing accuracy of 95%, significantly reducing the likelihood of defective processors entering the production line. Furthermore, we explore the optimization of our model using the OpenVINO toolkit, achieving a notable improvement in execution speed without compromising accuracy. The implications of this research extend beyond the semiconductor industry, offering potential applications in various mechanical engineering domains.

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Design of Socket’s Surface Defect Detection Using Machine Learning

  • Thanh Hoang Hao Nguyen,
  • Viet Hong Tran

摘要

Quality control in semiconductor manufacturing is critical for ensuring the reliability of electronic devices. Among the various challenges faced, the detection of surface defects on processor sockets remains a significant hurdle due to the limitations of manual inspection methods. This study introduces a machine learning-based approach to automate and enhance the accuracy of surface defect detection in processor sockets. We detail the development and implementation of a convolutional neural network (CNN) model, which leverages transfer learning techniques to overcome the constraints of limited and imbalanced data. Our methodology includes a comprehensive data acquisition process using high-definition digital microscopy, followed by data augmentation strategies to ensure robust model training. The results demonstrate that our model achieves a testing accuracy of 95%, significantly reducing the likelihood of defective processors entering the production line. Furthermore, we explore the optimization of our model using the OpenVINO toolkit, achieving a notable improvement in execution speed without compromising accuracy. The implications of this research extend beyond the semiconductor industry, offering potential applications in various mechanical engineering domains.