In the last chapter, we developed an algorithm to automatically design patterns of direct connections between LUTs by extracting information from placed circuits. In doing so, we were constructing the pattern to fit the direct-connection-oblivious mapping of circuits, with little effort invested in the opposite direction, to map the circuits to fit the constructed pattern: Our sole modification to the usual CAD flow was to permute LUTs within their respective clusters after placement, so as to align them with the endpoints of the added direct connections, which only altered the otherwise arbitrary intracluster placement produced by VPR.