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In semiconductor fabrication process etching is a fundamental technology, where it is used to selectively remove material from the surface of a wafer. This step is vital in crafting the intricate patterns and features which form the basis of an integrated circuit. With the ongoing drive in the semiconductor industry towards miniaturization, more compact chips, the need for advanced etching techniques is more crucial than ever. Therefore, this technology must continuously improve and evolve to meet the ever-shrinking feature size requirements. Here, in this review work for EEGR 742 Microelectronics class the history and current state of art of etching technologies will be discussed. With that the major challenges in etching for future nodes, evaluating recent breakthroughs and research, and assessing the impact of these advancements on the industry will also be examined.

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Etching Technologies in Semiconductor Manufacturing: A Short Review

  • 会议论文

  • 发表日期：

    2025年

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  • Sheikh S. Mahtab,
  • Rapsan A. Anonto,
  • Tanmay Talukder,
  • Ahamed Raihan,
  • Inzamamul Islam

摘要

In semiconductor fabrication process etching is a fundamental technology, where it is used to selectively remove material from the surface of a wafer. This step is vital in crafting the intricate patterns and features which form the basis of an integrated circuit. With the ongoing drive in the semiconductor industry towards miniaturization, more compact chips, the need for advanced etching techniques is more crucial than ever. Therefore, this technology must continuously improve and evolve to meet the ever-shrinking feature size requirements. Here, in this review work for EEGR 742 Microelectronics class the history and current state of art of etching technologies will be discussed. With that the major challenges in etching for future nodes, evaluating recent breakthroughs and research, and assessing the impact of these advancements on the industry will also be examined.