Light Field Manipulation and Applications of Capillary Discharge Extreme Ultraviolet Laser
摘要
In this paper, the light field manipulation and applications of the capillary discharge extreme ultraviolet (EUV) laser at 46.9 nm is reported. Because of the high-quality output parameters of the 46.9 nm laser and the various light-shaping focusing of phase and amplitude, this miniaturized EUV laser is suitable for coupling into the EUV laser application system, which could reduce the experimental expense and provide sufficient experimental hours.