The Physical Essence of the Method of Physical Vapor Deposition and the Equipment for Its Application

The article examines the physical principles of the physical vapor deposition method, which is based on three-stage molecular surface enlargement with enhanced operational properties. It identifies the most important factors influencing the quality of the surface obtained at each stage. The first stage is most dependent on the energy of ions, exposure time, the angle between the surface being covered and the flow direction, and the surface relief of the films. In the second stage, contact between the surface and the ion flow, as well as the kinetic energy transferred by the bombarding particles, have a greater impact. The third stage is characterized by significant surface matrix destruction. The article provides the schematic diagram and requirements for the installation for layered coating application, as well as specific models that meet the specified requirements. It presents the parameters of the coating application process, indicating the permissible limits. It outlines the influence of temperature throughout the coating application period, and provides the most optimal ranges. The results of the practical application of the discussed physical vapor deposition method through coating application on the shaping surface of a pressure mold matrix are presented. The operational durability was increased by not less than 30% compared to the traditionally used nitriding technology.