Scholarlink

Until the mid-1980s, the nMOS silicon-gate process was the most commonly used process for MOS LSI and VLSI circuits. However, nearly all modern VLSI and memory circuits are made in CMOS processes. CMOS circuits are explained in Chap. 4; the technology used for their manufacture is discussed in this chapter.

错误：搜索内容不能为空，请输入英文关键词
错误：关键词超出字数限制，请精简
高级检索

Manufacture of MOS Devices

  • 章节

  • 发表日期：

    2025年

查看全文
  • Harry Veendrick

摘要

Until the mid-1980s, the nMOS silicon-gate process was the most commonly used process for MOS LSI and VLSI circuits. However, nearly all modern VLSI and memory circuits are made in CMOS processes. CMOS circuits are explained in Chap. 4; the technology used for their manufacture is discussed in this chapter.