Repeatability of Automated Edge Coupling for Wafer Level Testing
摘要
In foundries environment the optical characterization of Photonic Integrated Circuits (PICs) for process control and device performance verification requires a high throughput test solution. So far, wafer-level characterization of PICs has been limited to the grating couplers as the optical input/output interface. We propose an alternative optical probing technique suitable for automated on-wafer measurements based on edge coupling. Here, we evaluate a solution based on FormFactor’s CM300-SiPh probe station and the Pharos Probe. A brief overview of the system is given and the repeatability of the coupling across the wafer is investigated.