Nanoimprint Lithography

Nanoimprinting is the alternative to optical, e-beam, and scanning tip lithography. It patterns a polymer layer by pressing a mold into it. Once a mold is made, the patterning process is just repeated replication of the mold, which can be high throughput and low cost. Nanoimprint lithography (NIL) covered by this chapter includes thermal, UV cured, and soft contact techniques. For each type of NIL technology, their relevant molds and polymers are introduced. The issues specific to NIL such as demolding and alignment are described. Two industrialized NIL technologies, jet and flash imprint lithography (J-FIL) and substrate conformal imprint lithography (SCIL), are presented in detail. Soft lithography employing soft molds and ink materials is also included in this chapter. Finally, four configurations of roll-to-roll nanoimprinting commonly used in industrial manufacturing are described, as well as on how to make seamless molds.