Smart Optical Inline Metrology
摘要
This chapter outlines modern approaches for inline metrology which helps to increase reliability of manufacturing processes and products. A major emphasis is placed on two specific metrology techniques. Also, there will be an introduction of important system components such as the data handling infrastructure and specifically developed light sources. In order to cope with high demands on surface texture, defect, and critical dimension control, a high-dynamic range interferometric technology is presented which enables sub-nm resolution on \({\upmu }\) m-sized features. The detection of residuals and contamination is performed with a specialized approach to laser-breakdown spectroscopy with high temporal and spectral resolution. These technologies are enabled by novel, super-continuum-based light sources which deliver new levels of brilliance, temporal control, and power. The conception, implementation, and characterization of these light sources are demonstrated. In order to facilitate highly integrated metrology, appropriate dataflow chains and infrastructure models are introduced and discussed.