Ion-Implantation of Ultrananocrystalline Diamond Films for Field Electron Emission Applications

Ultrananocrystalline diamond (UNCD) filmIon-implantation, a special form of diamond, has recently caught immense interest from researchers owing to its outstanding field electron emissionField electron emission (FEEFEE) characteristics in comparison with other forms of diamond. The UNCD film has to be electrically conductiveElectrically conductive, for utilizing it as an efficient material for the development of FEE devices. Ion implantation is as a suitable method to incorporate a selection of dopants for generating electrically conducting UNCD films. In this chapter, the improvement in the FEE characteristics of UNCD films because of ion implantation, particularly nitrogen- and metal- ion implantations, is investigated. The potential mechanism by which the change in granular structure and bonding characteristics improve the FEE properties of UNCD films owing to ion implantation is discussed.