Direct Patterning of Carbon Nanostructures

Various fabrication techniques have been developed to prepare carbon nanostructures with unique chemical, physical, optical, magnetic, electrical, and mechanical properties. Several applications, ranging from surfaces for optical displays and electronic devices to energy conversion, require large-area patterns of nanostructures with defined arrangement and spacing for efficient and consistent functionality. Carbon nanostructure patterns can be generated by both a top-down and bottom-up approach. Patterns can be designed on 2D films of carbon nanostructures using top-down processes such as patterned etching or material removal. Top-down patterning of carbon nanostructures is accomplished via lithography, reactive ion etching, electrochemical procedures, focused ion beam, and other techniques. Carbon nanostructures are formed in a predefined manner onto appropriate substrates in a bottom-up approach using processes such as self-assembly, stamping, composite formation, and so on. This chapter will chronicle, discuss, and compare existing top-down and bottom-up technologies for the fabrication of carbon nanostructures, with an emphasis on direct patterning methods in both of these categories.