During the last decade, the DNA origami technique has solidified its position as one of the most versatile methods for the fabrication of nanoscale structures, which can be further utilized as templates for a variety of devices and materials. The method has been utilized in many fields such as nanotechnology, photonics, material science, bioscience, and medicine. An especially promising application is the use of DNA origami nanostructures as lithography masks. Techniques such as DNA-assisted lithographyDNA-assisted lithography (DALI) have recently been developed to provide the resolution of e-beam lithography, i.e., a few nanometers, without time consuming and costly patterning steps. Especially intriguing is the use of self-organized DNA origami lattices to fabricate large surfaces with nanoscale features to achieve metamaterials via a cost-effective and practical way. Such self-organized DNA origami lattices have been realized over macroscopic surface areas on mica surfaces, which is a common substrate in DNA origami research. However, mica is not suitable for further processing, and transferring this technique to silicon substrates, the most used substrate in microfabrication, has been challenging. In this chapter, we present and discuss two successfully demonstrated approaches for the fabrication of ordered DNA origami lattices on oxidized silicon surfaces.