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<p><span lang="EN-US" style="font-size: 11.0pt; line-height: 106%; font-family: 'Calibri',sans-serif; mso-fareast-font-family: SimSun; mso-fareast-theme-font: minor-fareast; mso-bidi-font-family: 'Times New Roman'; mso-bidi-theme-font: minor-bidi; color: #1f497d; mso-ansi-language: EN-US; mso-fareast-language: EN-US; mso-bidi-language: AR-SA;">This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.</span><span lang="EN-US" style="font-size: 11.0pt; line-height: 106%; font-family: 'Calibri',sans-serif; mso-ascii-theme-font: minor-latin; mso-fareast-font-family: SimSun; mso-fareast-theme-font: minor-fareast; mso-hansi-theme-font: minor-latin; mso-bidi-font-family: 'Times New Roman'; mso-bidi-theme-font: minor-bidi; mso-ansi-language: EN-US; mso-fareast-language: EN-US; mso-bidi-language: AR-SA;">&#xa0;</span></p>

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CMOS Plasma and Process Damage

  • 书籍

  • 发表日期：

    2025年

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  • Kirk Prall

摘要

This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.