Synthesis and Physical Properties of Thin Ni–Al Films

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发表日期：

2024年4月1日

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V. N. Malikov,
A. O. Katasonov,
A. V. Ishkov,
S. A. Voinash,
R. R. Zagidullin,
A. M. Yakushev

摘要

Abstract

Ni–Al films produced by resistive thermal evaporation using a VUP-5 vacuum station are studied. The basic stages in film synthesis are described. The wavefront velocity in synthesis is determined, along with the radial growth rate of the nuclei (islands) formed. The grain size in the surface is investigated. Fourier analysis provides information regarding the structural properties of the surface. The electrical conductivity of the thin metallic film is determined.