Electron Irradiation-Induced Formation of the Surface Relief of Ge5As37S58/Se Multilayer Nanoperiodic Structure
摘要
Abstract
Electron beam recording of raster images in a Ge5As37S58/Se multilayer nanoperiodic structure (MNS) was carried out. The topography of the patterned Ge5As37S58/Se MNS surface was studied using an atomic force microscope (AFM). According to the obtained results, the contribution of the lateral mass transport to the surface relief formation on the MNS was established. The formation of ridge-like lines on the MNS surface under the fast jumping of an electron beam between its targeted locations was revealed.