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<b>Abstract</b>— <p>We examine the effect of an atmospheric-pressure Ar/CO<sup>2</sup> microwave torch on nanocarbon films formed on the surface of silicon wafers by vertical deposition from an ethyl colloidal solution of carbon nanoparticles. The spatial distribution of the microwave torch plasma temperature is obtained for the optimal plasma treatment regime, which does not lead to significant morphological changes in the surface. It is shown that the nanocarbon coating exhibits high resistance to plasma loading.</p>

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A Study of the Thermal Plasma Load of an Atmospheric-Pressure Microwave Torch on a Nanocarbon Coating

  • 期刊论文

  • 发表日期：

    2025年11月1日

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  • E. S. Kulikov,
  • Z. A. Zakletsky,
  • I. V. Moryakov,
  • V. I. Zhukov

摘要

Abstract—

We examine the effect of an atmospheric-pressure Ar/CO2 microwave torch on nanocarbon films formed on the surface of silicon wafers by vertical deposition from an ethyl colloidal solution of carbon nanoparticles. The spatial distribution of the microwave torch plasma temperature is obtained for the optimal plasma treatment regime, which does not lead to significant morphological changes in the surface. It is shown that the nanocarbon coating exhibits high resistance to plasma loading.