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Abstract <p>We report the results of examining the effect of two-photon laser lithography parameters, such as radiation power, lithography speed, and number of repeated exposures per area, on characteristics of the formed features. Analytical relationships are obtained for each parameter. The degree of oligomer conversion as a function of radiation power is analyzed.</p>

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Effect of Two-Photon Laser Lithography Parameters on the Characteristics of Fabricated Features

  • 期刊论文

  • 发表日期：

    2025年10月1日

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  • D. A. Kolymagin,
  • A. V. Pisarenko,
  • E. R. Zhiganshina,
  • M. V. Arseniev,
  • D. P. Emelyanov,
  • A. A. Matskevich,
  • S. A. Chesnokov,
  • A. G. Vitukhnovsky

摘要

Abstract

We report the results of examining the effect of two-photon laser lithography parameters, such as radiation power, lithography speed, and number of repeated exposures per area, on characteristics of the formed features. Analytical relationships are obtained for each parameter. The degree of oligomer conversion as a function of radiation power is analyzed.