Fabrication and characterization of SiC optically controlled bidirectional device based on PNP structure
摘要
A silicon carbide optically controlled bidirectional device based on PNP structure is designed and fabricated in this work. The lightly doped N region acts as the voltage-resistant region and photoconductive region to adjust the resistance and realize the bidirectional optically controlled switching-on of the device. The experimental results indicate that both forward and reverse breakdown voltage of the device are higher than 1 kV. Under 355 nm UV light, the device achieves a 73 mA peak on-state current at 300 V bias with a 10 ns rise time. It eliminates external diodes over the full voltage range, offering a compact and sub-microsecond bidirectional solution.
Graphical abstract