<p>The crystal structure, optical, and electrical parameters of Mg<sub>10</sub>Zn<sub>90</sub>O films prepared by spray pyrolysis and doped with 0–6.0 at% Al are studied. The films were investigated using scanning electronic microscopy, energy dispersive spectroscopy, X-ray diffraction, transmittance, photoluminescence, and resistivity monitoring. The Al-doped Mg<sub>10</sub>Zn<sub>90</sub>O films exhibit the wurtzite crystalline phase, but second phases, related to Al and AlO clusters, appear when Al exceeds 2.0 at%. The films are characterized by a transmittance of 80–90%, a high PL intensity and an electrical resistivity of 2.5 × 10<sup>−3</sup>Ωcm with 1.0 at%Al in the films. The studied Mg<sub>10</sub>Zn<sub>90</sub>O:Al films are important for optoelectronic applications.</p> Graphical abstract <p></p>

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Structure, optical and electrical characteristics of Al-doped MgxZn1-xO films obtained by spray pyrolysis

  • J. Oliveros Garcia,
  • B. El Filali,
  • T. Torchynska,
  • G. Polupan,
  • J. Douda,
  • L. Shcherbyna

摘要

The crystal structure, optical, and electrical parameters of Mg10Zn90O films prepared by spray pyrolysis and doped with 0–6.0 at% Al are studied. The films were investigated using scanning electronic microscopy, energy dispersive spectroscopy, X-ray diffraction, transmittance, photoluminescence, and resistivity monitoring. The Al-doped Mg10Zn90O films exhibit the wurtzite crystalline phase, but second phases, related to Al and AlO clusters, appear when Al exceeds 2.0 at%. The films are characterized by a transmittance of 80–90%, a high PL intensity and an electrical resistivity of 2.5 × 10−3Ωcm with 1.0 at%Al in the films. The studied Mg10Zn90O:Al films are important for optoelectronic applications.

Graphical abstract