2D materials-based ink to develop meta-structures for electromagnetic interference (EMI) shielding

2-D transition metal-chalcogenides (TMCs) are lucrative as frequency selective absorbers (FSAs) because of strong electronic polarization and enhanced dielectric loss. In the present work we have developed inks made of 2-D TMCs such as NiSe₂, CoSe₂ and used them to develop metastructures having high reflection loss. The structures have conductivity peaks depending on concentration of the 2D structure in the paint. It is observed that the absorption bandwidth and frequency seem to depend on the composition of 2D TMC along with the structures made. This provides an additional method to modulate the properties of FSA.