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<p>We report the fabrication and study of linear and third-order nonlinear optical properties of three methoxy-substituted nitro-chalcones (MNC, DMNC, TMNC)&#xa0;doped PMMA thin films at 5, 10, and 15 wt%. Chemical spray pyrolysis was used to prepare the films. UV–Vis–NIR spectra were employed to analyze linear absorption, transmittance, refractive index, and bandgap. The absorption cut-off observed&#xa0;below 500&#xa0;nm. Film thickness was measured using profilometer and FE-SEM examined the surface morphology. Third-order NLO parameters were investigated using a Ti:Sapphire femtosecond laser at 800&#xa0;nm. The nonlinear refraction, nonlinear absorption, and susceptibility values ranged from 0.7 to 2.34 × 10⁻<sup>12</sup> cm<sup>2</sup>/W, 3.1 to 3.85 × 10⁻<sup>17</sup> cm<sup>3</sup>/W<sup>2</sup>, and 4.02 to 13.33 × 10⁻<sup>11</sup> esu. Nonlinearity increased with doping concentration, with DMNC-PMMA films showing the highest enhancement. These films are suitable for ultrafast optical limiting at 800&#xa0;nm with thresholds of 4.27–17.65&#xa0;μJ/cm<sup>2</sup>.</p> Graphical Abstract <p></p>

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Effect of methoxy substitution on ultrafast third-order nonlinear optical properties in chalcone–PMMA thin films

  • 期刊论文

  • 发表日期：

    2025年12月8日

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  • Shivaraj R. Maidur,
  • Anusha N. Ekbote,
  • V. Vadhana Sharon,
  • Jitendra R. Jahagirdar,
  • M. A. Sayed,
  • Mohd Shkir

摘要

We report the fabrication and study of linear and third-order nonlinear optical properties of three methoxy-substituted nitro-chalcones (MNC, DMNC, TMNC) doped PMMA thin films at 5, 10, and 15 wt%. Chemical spray pyrolysis was used to prepare the films. UV–Vis–NIR spectra were employed to analyze linear absorption, transmittance, refractive index, and bandgap. The absorption cut-off observed below 500 nm. Film thickness was measured using profilometer and FE-SEM examined the surface morphology. Third-order NLO parameters were investigated using a Ti:Sapphire femtosecond laser at 800 nm. The nonlinear refraction, nonlinear absorption, and susceptibility values ranged from 0.7 to 2.34 × 10⁻12 cm2/W, 3.1 to 3.85 × 10⁻17 cm3/W2, and 4.02 to 13.33 × 10⁻11 esu. Nonlinearity increased with doping concentration, with DMNC-PMMA films showing the highest enhancement. These films are suitable for ultrafast optical limiting at 800 nm with thresholds of 4.27–17.65 μJ/cm2.

Graphical Abstract