Effect of nitrogen flow on structural and mechanical properties of (AlCrNbSiTi)Nx thin films
摘要
This study explores the correlation between microstructure and mechanical properties of (AlCrNbSiTi)Nx films deposited on Si (100) substrates via DC reactive magnetron sputtering under varied nitrogen flow (RN2 = N2/(Ar + N2)*100) of 0, 10, and 20%. Surface and cross-sectional morphologies were characterized by FE-SEM, crystal structure by XRD, and metal–nitride bonding by XPS. Additionally, nanoindentation tests were performed to determine the hardness and elastic modulus of the films. Morphology analysis showed granular features with columnar structures, and film thickness decreased as the nitrogen flow increased. XRD revealed a transition from amorphous to FCC structure at higher RN2, with the 10% film remaining amorphous due to incomplete nitride formation. Nanoindentation tests revealed that increasing the RN2 to 20% resulted in the highest hardness of 13 GPa with an elastic modulus of 170 GPa. Post-indentation tests showed radial cracks at 0% and blistering at 10% and 20%, indicating distinct fracture behavior.
Graphical abstract