Relation between residual stress and microstructure evolution in C19400 alloy based on different annealing parameters
摘要
The lead-frame C19400 strips are warped during the etching process due to the presence of the residual stress. Following annealing at 300 °C for 5 min, the residual stress decreased from 125.9 MPa (rolling direction, RD) and 137.1 MPa (transverse direction, TD) to 13.2 MPa (RD) and 16.5 MPa (TD). Following annealing at 500 °C, the alloy undergoes incomplete recrystallization. Moreover, there is a significant plastic mismatch between the “soft orientation” (Cube (001)<100>) and the “hard orientation” (S (123)<634> and Copper (112)<111>), resulting in an increase in residual stress. Furthermore, as the temperature increases, the