<p>Colloidal quantum dot-based short-wave infrared (SWIR) photodetectors are often limited by surface traps and high noise levels at room temperature. In this work, we present a low-temperature chemical bath deposition (CBD) strategy to grow a heterojunction passivation layer on HgTe quantum dot (QD) photoactive layers, enabling high-performance SWIR photodetection at room temperature. The CBD process achieves interfacial modification through a dual mechanism: sulfur ions penetrate the HgTe QD surface to form an Hg-S bonded interfacial region while simultaneously reacting with Cd<sup>2+</sup> in the bath to create a CdS electron-accepting layer, resulting in a compositionally graded CdS/Hg-S/HgTe structure. The resulting interfacial improvement, coupled with energy level modification, facilitates carrier separation and passivates surface defects, thus simultaneously enhancing the responsivity and reducing noise current of photodetectors. As a result, the phototransistor based on the CdS/HgTe photoactive layer demonstrates a high room-temperature specific detectivity of 4.43&#xa0;×&#xa0;10<sup>11</sup> Jones at 1550&#xa0;nm and maintains detectivity around 10<sup>10</sup> Jones at extended wavelengths up to 2500&#xa0;nm. These results underscore the importance of interfacial engineering in colloidal QDs-based photodetectors and demonstrate CBD as a scalable, silicon-compatible passivation approach for achieving cryogen-free SWIR optoelectronic devices.</p> Graphical abstract <p></p>

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Interfacial engineering with chemical bath deposition for high-performance HgTe quantum dot-based short-wave infrared photodetectors

  • Haoran Chen,
  • Yuwei Guo,
  • Yulia V. Kuznetsova,
  • Kseniia A. Sergeeva,
  • Arsenii S. Portniagin,
  • Xie He,
  • Hui Yu,
  • Andrey L. Rogach,
  • Ni Zhao

摘要

Colloidal quantum dot-based short-wave infrared (SWIR) photodetectors are often limited by surface traps and high noise levels at room temperature. In this work, we present a low-temperature chemical bath deposition (CBD) strategy to grow a heterojunction passivation layer on HgTe quantum dot (QD) photoactive layers, enabling high-performance SWIR photodetection at room temperature. The CBD process achieves interfacial modification through a dual mechanism: sulfur ions penetrate the HgTe QD surface to form an Hg-S bonded interfacial region while simultaneously reacting with Cd2+ in the bath to create a CdS electron-accepting layer, resulting in a compositionally graded CdS/Hg-S/HgTe structure. The resulting interfacial improvement, coupled with energy level modification, facilitates carrier separation and passivates surface defects, thus simultaneously enhancing the responsivity and reducing noise current of photodetectors. As a result, the phototransistor based on the CdS/HgTe photoactive layer demonstrates a high room-temperature specific detectivity of 4.43 × 1011 Jones at 1550 nm and maintains detectivity around 1010 Jones at extended wavelengths up to 2500 nm. These results underscore the importance of interfacial engineering in colloidal QDs-based photodetectors and demonstrate CBD as a scalable, silicon-compatible passivation approach for achieving cryogen-free SWIR optoelectronic devices.

Graphical abstract