A Study of the Space Charge-Limited Injection Currents in TiO₂-Based Thin-Film Metal-Dielectric Structures

Space charge-limited currents in Ti–TiO₂ thin-film structures have been studied. Using the experimental physical parameters of the TiO₂ dielectric, models of the formation of the space charge-limited injection currents have been constructed. The dependences of the injection current on the applied voltage, dielectric layer thickness, and parameters of electron traps have been explored. It is shown that the space charge-limited injection currents in the investigated structures depend significantly on both the depth and concentration of traps. The results obtained are compared with the dependences obtained previously for the BeO, Al₂O₃, and AlN structures.