Abstract <p>By direct-current magnetron sputtering (DCMS) and high-power impulse magnetron sputtering (HIPIMS) methods at peak currents of 50 and 100 A, as well as by applying a negative bias voltage of –500 V to a substrate with a target compound of Ti₂AlC, nanostructured coatings in the Ti–Al–C system with a thickness of 1.8–6.4 μm were obtained. The main phase in the coatings was titanium carbide; when using HIPIMS, the intermetallic compound TiAl was additionally formed. It was found that the coatings deposited by the DCMS method have a maximum hardness of 31 GPa and an elastic modulus of 294 GPa, as well as a low friction coefficient of 0.2, while the HIPIMS method, when using optimal conditions, provides a minimum wear rate of 5.1 × 10^–6 mm³ N^–1m^–1, thermal stability, and oxidation resistance up to 1000°С. The protective properties are associated with the formation of dense surface films based on aluminum oxide. The use of HIPIMS by applying a high negative bias voltage to the substrate promotes the precipitation of Ti₂AlC and Ti₃AlC₂ MAX-phase crystallites with a crystallite size of less than 100 nm during vacuum annealing of coatings at 1000°С.</p>