In Situ Mapping of Space Charge Region Activation Dynamics in SiC/Si-Based Heterostructures by KPFM/STS: Role of Interface State Recharging
摘要
This work presents a novel combined method for the in situ analysis of electronic properties of SiC/Si heterojunctions with submicron resolution (30 nm), integrating Kelvin probe force microscopy (KPFM) and scanning tunneling spectroscopy (STS). For the first time, we have experimentally discovered a threshold activation effect of the space charge region (SCR) with a characteristic delay time of 2.3 ± 0.5 s and nonexponential work function relaxation (τ = 35 ± 2 s, β = 0.65 ± 0.05), indicating an energy distribution of interface states with a characteristic energy of 0.12 eV. A quantitative correlation between interface morphology and spatial distribution of the density of states (