Study of the Edge Metallization Profile of Optically Transparent Windows Formed by Magnetron Sputtering
摘要
Abstract
The process of forming edge metallization on input windows (germanium, silicon, and other discs) used for introducing the received light flux into a photodetector housed in a protective hermetic casing is being investigated. This work presents the results of an experimental study on the dependence of the edge metallization profile of Ge discs, formed by magnetron sputtering, on the design parameters of the loading device. Various designs of loading devices are presented. The experimental results demonstrate the influence of thickness on the edge metallization profiles of the components of the loading device that mask the discs during sputtering.