Scholarlink

Abstract <p>This study analyzed the changes occurring on the surfaces of tantalum carbide and oxide under the influence of helium ions. A technique was employed to determine the composition and thickness of layers formed through the sputtering process of binary targets under the influence of light ions. The data obtained was utilized to calculate the thicknesses of the modified layers and their respective compositions. The results indicated that the surface layers contain a lower proportion of the lighter component compared to the original material, which aligns with experimental observations.</p>

错误：搜索内容不能为空，请输入英文关键词
错误：关键词超出字数限制，请精简
高级检索

Parameters of the Modified Tantalum Oxide and Carbide Layers under Stoichiometric Sputtering with Helium Ions

  • 期刊论文

  • 发表日期：

    2025年10月1日

查看全文
  • V. V. Manukhin

摘要

Abstract

This study analyzed the changes occurring on the surfaces of tantalum carbide and oxide under the influence of helium ions. A technique was employed to determine the composition and thickness of layers formed through the sputtering process of binary targets under the influence of light ions. The data obtained was utilized to calculate the thicknesses of the modified layers and their respective compositions. The results indicated that the surface layers contain a lower proportion of the lighter component compared to the original material, which aligns with experimental observations.