Emission Characteristics of a Laser-Plasma Source of Extreme Ultraviolet Radiation with Thin-Film Targets

期刊论文
发表日期：

2024年5月1日

查看全文

A. Ya. Lopatin,
V. I. Luchin,
A. N. Nachay,
A. A. Perekalov,
A. E. Pestov,
N. N. Salashchenko,
A. A. Soloviev,
N. N. Tsybin,
N. I. Chkhalo

摘要

Abstract

The radiation spectra in the soft X-ray and extreme ultraviolet wavelength ranges of thin-film (0.15 μm) targets made of light materials (Si, C, Be) were studied when excited by a Nd:YAG laser pulse with a duration of 5.2 ns focused to an intensity of ~10¹² W/cm². Line spectra of BeIII, BeIV, CV, and SiV ions were recorded using a spectrometer based on a multilayer X-ray mirror. A comparison with the spectra of bulk solid-state targets of the same materials is carried out. In all cases, there was a decrease in the intensity of the lines of the soft X-ray spectrum of film targets compared to monolithic ones; the decrease was, depending on the material, from several tens of percent to several times, with more than an order of magnitude less mass of the vaporized substance.