Thin Film Al Targets for a Laser-Plasma Source of Extreme Ultraviolet Radiation

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发表日期：

2024年2月1日

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S. A. Garakhin,
A. Ya. Lopatin,
A. N. Nechay,
A. A. Perekalov,
A. E. Pestov,
N. N. Salashchenko,
N. N. Tsybin,
N. I. Chkhalo

摘要

Abstract

Using a multilayer mirror spectrometer of the extreme ultraviolet (EUV) range, the laser plasma emission spectra of bulk aluminum in the wavelength range of 8.0–18.0 nm were studied. Testing of thin film laser targets made of aluminum and comparative measurements of the intensity of EUV radiation of a film with a thickness of 100 nm and a bulk material target were carried out.