Effect of Isovalent Zn-Doping on Electrical Conductivity in SnSe Thin Films
摘要
In this study, we propose an efficient strategy to improve the electrical properties of n-type tin selenide (SnSe) thin films by isovalent zinc (Zn) doping. The Zn-doped film constructed a network structure of crisscrossed SnSe nanosheets as origami to promote charge transport. Structural studies showed that Zn incorporation slightly enlarged the lattice and decreased the indirect bandgap from 0.95 eV in the undoped films to 0.79 eV in the Zn-doped samples. The Hall and Seebeck measurements at room temperature (RT) indicated n-type conduction of undoped and Zn-doped films. In contrast, the undoped films exhibited space-charge-limited current (SCLC) owing to deep trap states and weak nanosheet connectivity, whereas Zn doping restored ohmic conduction via enhanced carrier concentrations and improved nanosheet junctions. Collectively, this work demonstrates how isovalent Zn doping can suppress structural defects and activate improved electrical transport in SnSe thin films, thereby making them more suitable for future thermoelectric and optoelectronic applications.